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Plasma-Enhanced Atomic Layer Deposition (Ald) System

CanadaTenders notice for Plasma-Enhanced Atomic Layer Deposition (Ald) System. The reference ID of the tender is 121724997 and it is closing on 25 Jul 2025.

Tender Details

  • Country: Canada
  • Summary: Plasma-Enhanced Atomic Layer Deposition (Ald) System
  • CAT Ref No: 121724997
  • Deadline: 25 Jul 2025
  • Financier: Self Financed
  • Purchaser Ownership: Government
  • Tender Value: Refer Document
  • Notice Type: Tender
  • Document Ref. No.: 40151-2A-RFP
  • Purchaser's Detail:
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  • Description:
  • The University is soliciting prospective proponents to submit proposals for a Plasma-Enhanced Atomic Layer Deposition (ALD) System.Atomic layer deposition is a technology that deposits materials conformally monolayer by monolayer on substrates. The technique is particularly well-suited to the deposition of very thin dense dielectrics. The technique is high-precision and highly flexible, ideal for Research and Development (R&D), rapid prototyping, and small-batch production. The scope of this project is to select and acquire a plasma-enhanced ALD system for R&D purposes.The intention of this tender is to acquire a modular high-vacuum plasma-enhanced ALD system designed for the high-uniformity high-density deposition of thin films on substrates of various shapes and sizes, tailor-made for research and prototyping endeavors. This tool will be used to perform rapid prototyping of semiconductor and photonic devices within the ISO-7 (clean room environment) laboratories of the Advanced Research Center (ARC) at the University of Ottawa. The system must be fully automated, is expected to be robust, reliable, require low maintenance and incorporate control software that is flexible, user-friendly and accessible for multiple users, including students. The University greatly values extended warranty and the quality of the included elements. The University is interested in compact floor-standing models of the tool.Mandatory Requirements:1. Plasma-Enhanced Atomic Layer Deposition (ALD) and ...
  • Documents:

 Tender Notice

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Plasma-Enhanced Atomic Layer Deposition (Ald) System - Canada Tender

The UNIVERSITY OF OTTAWA, a Government sector organization in Canada, has announced a new tender for Plasma-Enhanced Atomic Layer Deposition (Ald) System. This tender is published on CanadaTenders under CAT Ref No: 121724997 and is categorized as a Tender. Interested and eligible suppliers are invited to participate by reviewing the tender documents and submitting their bids before the deadline on 2025-07-25.

The estimated tender value is Refer Document, and full details, including technical specifications and submission requirements, are provided in the official tender documents. Ensure all submissions meet the criteria outlined to be considered for evaluation.

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